Overview on FEBID
Kees Hagen, University of Technology Delft (NL)
Ultimate resolution in EBID: Modelling, Problems, and Perspectives.
Ted Liang, INTEL (USA)
FEBIP applications for semiconductor industry.
Gas assisted FEB / FIB continuum models
Klaus Edinger, Zeiss (D)
Modelling of beam induced reaction kinetics, applications, and research opportunities.
Milos Toth, FEI (USA)
The role of growth kinetics in high resolution electron beam induced etching and deposition.
Monte Carlo Simulations of FEBIP
Philip Rack, University of Tennessee, Knoxville (USA)
Overview of FEBIP Simulation, Experimentation and Recent Applications.
Electron induced molecule reactions, electron damage
Nigel Mason, The Open University (UK)
Electron Induced Chemistry; Chemical Control at the Molecular Level.
Howard Fairbrother, J. Hopkins University, Baltimore (USA)
Surface chemistry and reaction dynamics of EBID processes.
Michael Allan, Université de Fribourg (CH)
Electron-driven chemistry and physics of isolated molecules.
Larry Scipioni, Zeiss / ALIS (USA)
The He-Ion microscope: Performances and first results on beam induced chemistry.
Hans Loeschner, IMS-Nanofabrication (AU)
Projection Mask-Less Patterning (PMLP) for Nanotechnology Applications.
Lunch will be served at the workshop location.
Monday evening: Workshop dinner.