E-beam evaporation system BAK UNI
The BAK 501 UNI E-beam evaporator from Evatec LI AG is a versatile physical vapor deposition (PVD) system for process development or production in small substrate sizes or volumes.
BAK 501 UNI E-beam evaporator from Evatec LI AG
Key specifications of BAK Uni
- ESQ212A electron beam gun
- 4 up to 10 pocket crucibles
- Substrates size up to 100x100 mm2 or 150 mm diameter wafer
- Rotatable sample holder with manual tilt function
- Quartz crystal deposition rate monitor
- Deposition uniformity <=2% for 150 mm wafer and run-to-run reproducibility <=5%
- Process control system “Khan Server”
Possible materials
Precise evaporation of single and multilayer coatings of numerous refractory materials such as Al, Cu, Ni, Mg, Mo, SiO2, Al2O3, MgF, etc. for various applications:
- Optics and microoptics
- Optoelectronics
- Semiconductors
- R&D and prototyping
Further Information on possible applications
You find further information about this technology or possible applications on the webpages of the Laboratory for Thin Films and Photovoltaics.
If you are interested and want to get more information, please contact .
